Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano10: Difference between revisions
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C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs | C4F8 52 sccm, SF6 38 sccm, 4 mTorr, Strike 3 secs @ 15 mTorr, 800 W CP, 50 W PP, 10 degs, 120 secs | ||
</gallery> | </gallery> | ||
{| {{table}} | |||
| align="center" style="background:#f0f0f0;"|'''Nominal trench line width''' | |||
| align="center" style="background:#f0f0f0;"|'''''' | |||
| align="center" style="background:#f0f0f0;"|'''30''' | |||
| align="center" style="background:#f0f0f0;"|'''60''' | |||
| align="center" style="background:#f0f0f0;"|'''90''' | |||
| align="center" style="background:#f0f0f0;"|'''120''' | |||
| align="center" style="background:#f0f0f0;"|'''150''' | |||
| align="center" style="background:#f0f0f0;"|'''Avg''' | |||
| align="center" style="background:#f0f0f0;"|'''Std''' | |||
|- | |||
| ER||nm/min||239||281||306||320||328||295||36 | |||
|- | |||
| SA||degs||93||94||93||92||93||93||1 | |||
|- | |||
| base||nm/edge||-1||-5||-11||-9||-32||-11||12 | |||
|- | |||
| foot||nm/edge||-1||-5||-11||-9||-2||-5||5 | |||
|- | |||
| Bowing||||41||33||29||30||22||31||7 | |||
|- | |||
| Curve||||-51||-50||-43||-39||-42||-45||5 | |||
|- | |||
| zep||nm/min||||||||||||46|| | |||
|- | |||
| | |||
|} | |||
== Comments == | == Comments == | ||