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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Line 117: Line 117:
*AZ 351B
*AZ 351B
*AZ 726 MIF
*AZ 726 MIF
|AZ 726 MIF
|
 
*AZ 726 MIF
[[Specific_Process_Knowledge/Lithography/nLOF#Development|Solvent development]] may be possible
*[[Specific_Process_Knowledge/Lithography/nLOF#Development|Solvent development]] possible
|AZ 726 MIF
|AZ 726 MIF
|mr-DEV 600 (PGMEA)
|mr-DEV 600 (PGMEA)
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