Specific Process Knowledge/Wafer cleaning/Bring samples into cleanroom: Difference between revisions
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==Triton-X soap cleaning== | ==Triton-X soap cleaning== | ||
[[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]] | [[Image:Sonic-clean.jpg|300x300px|thumb|Soap sonic clean placed in the wash bench in the changing room (gowning). ]] | ||
The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a | The soap sonic is done in a tank with ultrasonics placed in the cleaning bench in the changing room. The cleaning solution is DI water to which a little diluted Triton X-100 is added. Triton X-100 is a non-ionic detergent which is metal ion-free. This detergent is added to reduce surface tension and thus helps removing particles from the samples to be cleaned. | ||
===Procedure=== | ===Procedure=== | ||