Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/Cretch: Difference between revisions
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A quasi atomic layer etching of chromium. | A quasi atomic layer etching of chromium. | ||
Read more on [[media:Cr and CrOx etching using SF6 and O2 plasma.pdf | Cr and CrO<sub>x</sub> etching using SF<sub>6</sub> and O2 plasma]] | Read more on [[media:Cr and CrOx etching using SF6 and O2 plasma.pdf | Cr and CrO<sub>x</sub> etching using SF<sub>6</sub> and O2 plasma]] | ||
Latest revision as of 07:34, 4 April 2025
A quasi atomic layer etching of chromium.
Read more on Cr and CrOx etching using SF6 and O2 plasma