Specific Process Knowledge/Lithography: Difference between revisions

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 | style="border-radius: 10px; background: #f9f9f9; border: 1px #aaa solid; width: 20%"; valign="top" |
 '''<big><div class="center">Pre-lithography</div></big>'''
+<div class="center"><hr width="75%"></div>
+<br>
 '''[[Specific Process Knowledge/Lithography/Resist|Resist]]'''
 *[[Specific_Process_Knowledge/Lithography/Resist#User_resist_bottles_in_the_cleanroom|User bottles in the cleanroom]]
@@ Line 117: / Line 117: @@
 *[[Specific_Process_Knowledge/Lithography/Resist#E-beam_Resist|E-beam Resist]]
 *[[Specific_Process_Knowledge/Lithography/Resist#Imprint_Resist|Imprint Resist]]
 '''[[Specific Process Knowledge/Lithography/Pretreatment|Substrate Pre-treatment]]'''
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 | style="border-radius: 10px; background: #f9f9f9; border: 1px #aaa solid; width: 20%"; valign="top" |
 '''<big><div class="center">Coating</div></big>'''
+<div class="center"><hr width="75%"></div>
+<br>
 '''[[Specific Process Knowledge/Lithography/Coaters|Automatic spin coating]]'''
 *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]]
 *[[Specific Process Knowledge/Lithography/DUVStepperLithography#SÜSS Spinner-Stepper|Spin Coater: Süss Stepper]]
 *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]]
 '''[[Specific Process Knowledge/Lithography/Coaters|Manual spin coating]]'''
 *[[Specific Process Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]
 *[[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Labspin|Spin Coater: Labspin 02/03]]
 '''[[Specific Process Knowledge/Lithography/Coaters|Spray coating]]'''
 *[[Specific_Process_Knowledge/Lithography/Coaters#Spray_Coater|Spray Coater]]
 '''[[Specific Process Knowledge/Lithography/Baking|Soft & hard baking]]'''
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 | style="border-radius: 10px; background: #f9f9f9; border: 1px #aaa solid; width: 20%"; valign="top" |
 '''<big><div class="center">Exposure/design transfer</div></big>'''
+<div class="center"><hr width="75%"></div>
+<br>
 '''[[Specific Process Knowledge/Lithography/UVExposure|UV Exposure Tools]]'''
 *[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_MA6-1|Aligner: MA6-1]]
@@ Line 159: / Line 155: @@
 *[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_03|Aligner: Maskless 03]]
 *[[Specific_Process_Knowledge/Lithography/UVExposure#Aligner:_Maskless_04|Aligner: Maskless 04]]
 '''[[Specific_Process_Knowledge/Lithography/DUVStepperLithography|Deep-UV Exposure]]'''
 *[[Specific_Process_Knowledge/Lithography/DUVStepperLithography#DUV_Stepper|DUV Stepper (Canon FPA-3000EX4)]]
 '''[[Specific Process Knowledge/Lithography/EBeamLithography|Electron Beam Exposure]]'''
 *[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_9500_User_Guide|JEOL 9500]]
 *[[Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE|Raith Eline]]
 '''[[Specific_Process_Knowledge/Imprinting|Nano Imprint Lithography]]'''
@@ Line 176: / Line 169: @@
 | style="border-radius: 10px; background: #f9f9f9; border: 1px #aaa solid; width: 20%"; valign="top" |
 '''<big><div class="center">Development</div></big>'''
+<div class="center"><hr width="75%"></div>
+<br>
 '''[[Specific Process Knowledge/Lithography/Development|Manual development]]'''
 *[[Specific_Process_Knowledge/Lithography/Development#Manual_beaker_development_in_fumehood|Manual beaker development]]
 '''[[Specific Process Knowledge/Lithography/Development|SU-8 development]]'''
 *[[Specific_Process_Knowledge/Lithography/Development#Developer:_SU8_(Wet_Bench)|Developer: SU8 (Wetbench)]]
 '''[[Specific Process Knowledge/Lithography/Development|Semi-automatic puddle development]]'''
 *[[Specific_Process_Knowledge/Lithography/Development#Developer:_E-beam_02|Developer: E-beam 02]]
 *[[Specific_Process_Knowledge/Lithography/Development#Developer:_TMAH_Manual_02|Developer: TMAH Manual 02]]
 '''[[Specific Process Knowledge/Lithography/Development|Automatic puddle development]]'''
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 | style="border-radius: 10px; background: #f9f9f9; border: 1px #aaa solid; width: 20%"; valign="top" |
 '''<big><div class="center">Post-lithography</div></big>'''
+<div class="center"><hr width="75%"></div>
+<br>
 '''[[Specific Process Knowledge/Lithography/Descum|Descum]]'''
 *[[Specific Process Knowledge/Lithography/Descum#Plasma_Asher_3:_Descum|Plasma Asher 3: Descum]]
@@ Line 204: / Line 194: @@
 *[[Specific Process Knowledge/Lithography/Descum#Plasma_Asher_5|Plasma Asher 5]]
 *[[Specific_Process_Knowledge/Etch/Wet_Silicon_Oxide_Etch_(BHF)|BHF]]
 '''[[Specific Process Knowledge/Lithography/LiftOff|Lift-off]]'''
 *[[Specific Process Knowledge/Lithography/LiftOff#Lift-off_wet_bench_07|Lift-off]]
 '''[[Specific Process Knowledge/Lithography/Strip|Strip]]'''