Jump to content

Specific Process Knowledge/Lithography/Development/Developer TMAH UV-lithography processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,528 edits
Mmat (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, Administrators
1,954 edits
Line 98: Line 98:


Multiple puddle:
Multiple puddle:
*'''(10??) DCH 100mm MP 3x60s'''
*'''(1019) DCH 100mm MP 3x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1010) DCH 100mm MP 4x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
*'''(1012) DCH 100mm MP 5x60s'''
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Development/Developer_TMAH_UV-lithography_processing"