Specific Process Knowledge/Wafer cleaning/Cleaning with Soap Sonic: Difference between revisions
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=Bringing samples into the DTU Nanolab cleanroom= | =Bringing samples into the DTU Nanolab cleanroom= | ||
To avoid cross contamination of fabrication tools and in order to keep particle levels at a minimum it is in general not allowed to bring substrates processed outside the cleanroom into the cleanroom. Users who need to bring this type of substrates into the cleanroom for processing or characterization must obtain permission to do so. This can be obtained by filling out the [[:File:Request to bring Samples into CR v1.51.docx|Request to bring samples into cleanroom form]] and submitting it to [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk]. | To avoid cross contamination of fabrication tools and in order to keep particle levels at a minimum it is in general not allowed to bring substrates processed outside the cleanroom into the cleanroom. Users who need to bring this type of substrates into the cleanroom for processing or characterization must obtain permission to do so. This can be obtained by filling out the [[:File:Request to bring Samples into CR v1.51.docx|Request to bring samples into cleanroom form]] and submitting it to [mailto:training@nanolab.dtu.dk training@nanolab.dtu.dk]. | ||
If permission is granted the standard cleaning process for the approved substrates are | |||
# Soap sonic cleaning as described below | |||
# 10 min cleaning in a piranha solution (sulphuric acid and hydrogen peroxide) | |||
If the samples can not handle such a cleaning process it must be specified in the form and an alternative cleaning process must be suggested by the user. | |||
==Cleaning of samples that have been out of the cleanroom== | ==Cleaning of samples that have been out of the cleanroom== | ||