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	Mo wet etch	Dry etch
Generel description	Wet etch of Mo using Chrome etch 18	Dry etch of Mo
Etch rate range	120 nm etch after 30 sec (not tested yet)	(not tested yet)
Etch profile	Isotropic	Anisotropic (not tested yet)
Masking material	AZ resist as a mask (hard baked at 120C for 120sec) led to an under etch of 2ish µm	Not tested yet
Substrate size	Any size and number that can go inside the beaker in use
Allowed materials	No restrictions cross contamination wise as long as you use the right beaker and make sure that they are safe to enter in the chemicals

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-![[Specific Process Knowledge/Etch/Wet Molybdæn Etch|Mo wet etch]]
+![[Specific Process Knowledge/Etch/Wet Chromium Etch|Mo wet etch]]
-![[Specific_Process_Knowledge/Etch/Dry etch]]
+! Dry etch
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