Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
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*Blue film | *Blue film | ||
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*Silicon | |||
*Silicon Oxide | |||
*Silicon Nitride | |||
*Silicon Oxynitride | |||
*Photoresist | |||
*E-beam resists | |||
*DUV resists | |||
*Aluminium (only for masking | |||
*Chromium (only for masking and on the back side if fused silica) | |||
*Quartz/fused silica | |||
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*Silicon | *Silicon | ||
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*DUV resists | *DUV resists | ||
*Aluminium | *Aluminium | ||
*Chromium ( | *Chromium (only for masking and on the back side if fused silica) | ||
*Quartz/fused silica | *Quartz/fused silica | ||
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