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Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions

Bghe (talk | contribs)
Bghe (talk | contribs)
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*Isotropic etch
*Isotropic etch
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*Anisotropic etch: vertical sidewalls. Should mainly be used for samples with small amounts of metals on.
*Anisotropic etch: vertical sidewalls.  
*Primarily for samples with small amounts of metals on.
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*Anisotropic etch: vertical sidewalls
*Anisotropic etch: vertical sidewalls
*Premarily for III-V samples
*Primarily for III-V samples
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*Anisotropic etch: vertical sidewalls
*Anisotropic etch: vertical sidewalls
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*Primarily for pure physical etch by sputtering with Ar-ions
*Primarily for pure physical etch by sputtering with Ar-ions
*Also for slanted gratings
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*Gas phase HF etching with ethanol as carrier
*Gas phase HF etching with ethanol as carrier