Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
| Line 67: | Line 67: | ||
| 2024<br>FAT/SAT | | 2024<br>FAT/SAT | ||
| 0.5 µm | | 0.5 µm | ||
| Raster | | Raster<br>(365nm) | ||
| 80 mJ/cm<sup>2</sup> | | 80 mJ/cm<sup>2</sup> | ||
| 10 (optical) | | 10 (optical) | ||
| Line 79: | Line 79: | ||
| 2024<br>During installation | | 2024<br>During installation | ||
| 1.5 µm | | 1.5 µm | ||
| Raster | | Raster<br>(365nm) | ||
| 85 mJ/cm<sup>2</sup> | | 85 mJ/cm<sup>2</sup> | ||
| 15 (optical) | | 15 (optical) | ||
| Line 91: | Line 91: | ||
| 2025-??-??</span><br>elkh? | | 2025-??-??</span><br>elkh? | ||
| 15 µm | | 15 µm | ||
| Raster | | Raster<br>(365nm) | ||
| ? mJ/cm<sup>2</sup> | | ? mJ/cm<sup>2</sup> | ||
| ? (?) | | ? (?) | ||
| Line 123: | Line 123: | ||
| 2024<br>FAT/SAT | | 2024<br>FAT/SAT | ||
| 0.5 µm | | 0.5 µm | ||
| Vector | | Vector<br>(405nm) | ||
| | | | ||
Pen: 1µm<br> | Pen: 1µm<br> | ||
| Line 139: | Line 139: | ||
| 2025-??-??<br>taran? | | 2025-??-??<br>taran? | ||
| 1.5 µm | | 1.5 µm | ||
| Vector | | Vector<br>(405nm) | ||
| | | | ||
Pen: 1µm<br> | Pen: 1µm<br> | ||