Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions

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-Aligner: Maskless 04 is both a direct writer and not a direct laser writer. In Raster mode, it works like MLA 1, 2, and 3, where an image is projected onto the substrate surface, and stepped/scanned across the substrate in order to produce the entire pattern. In Vector mode, it is a direct laser writer, where a focused laser beam is moved across the substrate surface in order to trace out the pattern.
+Aligner: Maskless 04 is both a direct writer and not a direct laser writer. In Raster mode, it works like MLA 1, where an image is projected onto the substrate surface, and stepped across the substrate in order to produce the entire pattern. In Vector mode, it is a direct laser writer, where a focused laser beam is moved across the substrate surface in order to trace out the pattern.
 The writing head of the Aligner: Maskless 04 moves only in the z-direction. Using a focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses.