Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
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<i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | <i> Unless otherwise stated, this page is written by <b>DTU Nanolab internal</b></i> | ||
[[Category: Equipment|Thin film LPCVD Poly]] | [[index.php?title=Category:Equipment|Thin film LPCVD Poly]] | ||
[[Category: Furnaces|LPCVD Poly]] | [[index.php?title=Category:Furnaces|LPCVD Poly]] | ||
[[Category: Thin Film Deposition|LPCVD Poly]] | [[index.php?title=Category:Thin Film Deposition|LPCVD Poly]] | ||
==Deposition of | ==Deposition of Silicon using LPCVD== | ||
[[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|4" polysilicon furnace (B4) located in cleanroom B-1]] | [[Image:A4_Furnace_PolySi.jpg|300x300px|thumb|4" polysilicon furnace (B4) located in cleanroom B-1]] | ||
[[Image:E2.JPG|300x300px|thumb|6" polysilicon furnace located (E2) in cleanroom E-6]] | [[Image:E2.JPG|300x300px|thumb|6" polysilicon furnace located (E2) in cleanroom E-6]] | ||
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The A, B, C and E stack furnaces can be controlled either from a touch screen by each furnace or from a furnace computer. The user manual for the furnace computer can be found here: | The A, B, C and E stack furnaces can be controlled either from a touch screen by each furnace or from a furnace computer. The user manual for the furnace computer can be found here: | ||
[[ | [[index.php?title=Media:Furnace computer manual.pdf|Manual for furnace computers for the A, B, C and E stack furnaces]] | ||
==Process information== | ==Process information== | ||