Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
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==Substrate centering== | ==Substrate centering== | ||
During (4") substrate detection, the sample is scanned diagonally. From these measurements, the diameter of the substrate is calculated, as well as the stage position matching the center of the substrate. This stage position will be the default origin for the subsequent exposure. | During (4") substrate detection, the sample is scanned diagonally. From these measurements, the diameter of the substrate is calculated, as well as the stage position matching the center of the substrate. This stage position will be the default origin for the subsequent exposure. | ||
<br/>The result of testing the centering on a couple of wafers has shown offsets of the | <br/>The result of testing the centering on a couple of wafers has shown offsets of the printed pattern from the substrate center in excess of 0.5mm. This is worse than the results observed on MLA 1, 2, and 3. | ||
==Flat alignment== | ==Flat alignment== | ||