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Deposition of SiN with PECVD4/NEW TESTS QC: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Mfarin (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
781 edits
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[[File:25W - reflected power QC nitride.png|thumb|593x593px|Reflected power of different tests, whit 25W as the demanded power.|center]]
[[File:25W - reflected power QC nitride.png|thumb|593x593px|Reflected power of different tests, with 25W as the demanded power.|center]]




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[[File:100W refractive index ellip vs filmtek.png|thumb|435x435px|Wafers processed with 100W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]
[[File:100W refractive index ellip vs filmtek.png|thumb|435x435px|Wafers processed with 100W had the refractive index measured in both Filmtek and Ellipsometer, comparing the results.]]


[[File:100W reflected power QC nitride.png|center|thumb|593x593px|Reflected power of different tests, whit 100W as the demanded power.]]
[[File:100W reflected power QC nitride.png|center|thumb|593x593px|Reflected power of different tests, with 100W as the demanded power.]]
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