Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
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Aligner: Maskless 04 offers not only two exposure modes, but also two autofocus modes; optical or pneumatic. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | Aligner: Maskless 04 offers not only two exposure modes, but also two autofocus modes; optical or pneumatic. The defocus process parameter is used to compensate for offsets between the autofocus mechanism and the focal point of the exposure light, and simultaneously optimize print quality in different resists and varying thicknesses. | ||
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'''Pneumatic autofocus:''' Uses compressed air flowing through the nozzle of the writehead to focus on the substrate surface. Substrates must be at least 5x5 mm to be successfully loaded. The pneumatic AF fails at some distance from the substrate edge, which means that in order to have any useful area in the center of the sample when using the pneumatic AF, the substrate must likely be larger than 5x5 mm. When using the pneumatic autofocus, we recommend a substrate size of at least 10x10 mm. | '''Pneumatic autofocus:''' Uses compressed air flowing through the nozzle of the writehead to focus on the substrate surface. Substrates must be at least 5x5 mm to be successfully loaded. The pneumatic AF fails at some distance from the substrate edge, which means that in order to have any useful area in the center of the sample when using the pneumatic AF, the substrate must likely be larger than 5x5 mm. When using the pneumatic autofocus, we recommend a substrate size of at least 10x10 mm. | ||
==Exposure dose and defocus== | |||
'''Raster mode''' | '''Raster mode''' | ||