Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 04 processing: Difference between revisions
| Line 13: | Line 13: | ||
[[Image:section under construction.jpg|70px]] | [[Image:section under construction.jpg|70px]] | ||
==Raster mode== | |||
Aligner: Maskless 01 is not a direct writer. In the maskless aligner, the exposure light is passed through a spatial light modulator, much like in a video projector, and projected onto the substrate, thus exposing an area of the design at a time. The substrate is exposed by stepping the exposure field across the substrate. | Aligner: Maskless 01 is not a direct writer. In the maskless aligner, the exposure light is passed through a spatial light modulator, much like in a video projector, and projected onto the substrate, thus exposing an area of the design at a time. The substrate is exposed by stepping the exposure field across the substrate. | ||
| Line 20: | Line 22: | ||
The writing head of the Aligner: Maskless 01 moves only in the z-direction. Using a pneumatic focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses. | The writing head of the Aligner: Maskless 01 moves only in the z-direction. Using a pneumatic focusing system, the maskless aligner is able to do real-time autofocus. The defocus process parameter is used to compensate offsets in the focusing mechanism, and to optimize printing quality in different resists and varying thicknesses. | ||
The stage of the Aligner: Maskless 01 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design. | The stage of the Aligner: Maskless 01 moves only in x and y. It has no theta-axis. All rotation during alignment is thus accomplished by transformation of the input design. | ||
==Vector mode== | |||
=Process Parameters= | =Process Parameters= | ||