Specific Process Knowledge/Lithography/Strip: Difference between revisions
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==Comparison of ashing rate between substrate sizes for plasma asher 4 & 5== | ==Comparison of ashing rate between substrate sizes for plasma asher 4 & 5== | ||
[[File:PA_comparison_v2.png| | [[File:PA_comparison_v2.png|400px|thumb|Comparison of ashing rate with different sibstrate sizes. Process was done using a single substrate placed in the middle of the glass boat, which was placed in the center of the chamber.|right]] | ||
The ashing rate is slightly higher for 100 mm substrates, but there is no difference between a 150 mm wafer and a 200 mm wafer. | The ashing rate is slightly higher for 100 mm substrates, but there is no difference between a 150 mm wafer and a 200 mm wafer. | ||