Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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</gallery> | </gallery> | ||
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=== End point signal=== | |||
====Barc etch==== | |||
====Cr etch==== | |||
<gallery caption="S047676 47s 7:43 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="2"> | |||
File:data 05 screen shot 02.jpg | |||
File:data 05 screen shot 04.jpg | |||
</gallery> | |||
==Etched too long== | ==Etched too long== | ||