Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions

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 <gallery caption="S047670 30 s barc etch, 7:45 min Cr etch, Feb-2025, wafer center, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="1">
+File:S047670midt_cr_05.jpg
+File:S047670midt_cr_04.jpg
+File:S047670midt_cr_08.jpg
+File:S047670midt_cr_01.jpg
+File:S047670midt_cr_10.jpg
+File:S047670midt_cr_12.jpg
+File:S047670midt_cr_16.jpg
+</gallery>
+|
+<gallery caption="S047670 30 s barc etch, 7:45 min Cr etch, Feb-2025, wafer edge, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="1">
 File:S047670edge_cr_01.jpg
 File:S047670edge_cr_03.jpg
 File:S047670edge_cr_04.jpg
 File:S047670edge_cr_06.jpg
+-
 File:S047670edge_cr_08.jpg
 File:S047670edge_cr_09.jpg
--
 </gallery>
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-<gallery caption="S047670 30 s barc etch, 7:45 min Cr etch, Feb-2025, wafer edge, 100 nm Cr mask, with 500 nm resist" widths="600px" heights="550px" perrow="1">
-File:S047670midt_cr_01.jpg
-File:S047670midt_cr_04.jpg
-File:S047670midt_cr_05.jpg
-File:S047670midt_cr_08.jpg
-File:S047670midt_cr_10.jpg
-File:S047670midt_cr_12.jpg
-File:S047670midt_cr_16.jpg
-</gallery>
-|-
-|
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-|-
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 |}
 ==Etched too short==