Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium/End point: Difference between revisions
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==Etched close to optimal== | ==Etched close to optimal== | ||
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!Middel of the wafer | |||
!Close to wafer edge | |||
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==Etched too long== | ==Etched too long== | ||
==Etched too short== | ==Etched too short== | ||