Specific Process Knowledge/Pattern Design: Difference between revisions
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Install CleWin 5 software on your local computer: [[Specific Process Knowledge/Pattern Design/CleWin|Click here for guidelines.]] | Install CleWin 5 software on your local computer: [[Specific Process Knowledge/Pattern Design/CleWin|Click here for guidelines.]] | ||
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=== Layout file format=== | === Layout file format=== | ||
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* For '''DUV-lithography''' and DUV-lithography it is necessary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | * For '''DUV-lithography''' and DUV-lithography it is necessary to have physical masks (reticles) produced based on the layout file. The file format has to be GDS. For more details concerning the design of reticles see [[Specific_Process_Knowledge/Lithography/DUVStepperLithography#Process_information|Design of Reticles]]. | ||
== Mask Design for UV-lithography == | == Mask Design for UV-lithography == | ||
Here you can find tips and tricks for mask designing. | Here you can find tips and tricks for mask designing. | ||