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Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions

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AR-N 7520 New is a resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.
AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.  


=Contrast curve=
=Contrast curve=

Revision as of 09:53, 20 January 2025

AR-N 7520 New is a negative resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.

Contrast curve

  • Coater: LabSpin 2
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s
  • Speed: 4000 RPM
  • Time: 60 s
  • Baking temperature: 85C
  • Baking time: 60 s
  • Exposure: 100 kV (JEOL 9500)
  • Development: AR 300-46 for 90 seconds
  • Stopper: IPA for 30 seconds + blow dry with nitrogen


AR-N 7520.17 New contrast curve.

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