Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions

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 * Development: AR 300-46 for 90 seconds
 * Stopper: IPA for 30 seconds + blow dry with nitrogen
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:ARN7520New contrast curve.png|800px]]
+|-
+| colspan="1" style="text-align: center;|
+AR-N 7520.17 contrast curve.
+|}