Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions
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* Development: AR 300-46 for 90 seconds | * Development: AR 300-46 for 90 seconds | ||
* Stopper: IPA for 30 seconds + blow dry with nitrogen | * Stopper: IPA for 30 seconds + blow dry with nitrogen | ||
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AR-N 7520.17 contrast curve. | |||
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Revision as of 09:50, 20 January 2025
AR-N 7520 New is a resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.
Contrast curve
- Coater: LabSpin 2
- Substrate: 2" Si
- Acceleration: 1000 RPM/s
- Speed: 4000 RPM
- Time: 60 s
- Baking temperature: 85C
- Baking time: 90 s
- Exposure: 100 kV (JEOL 9500)
- Development: AR 300-46 for 90 seconds
- Stopper: IPA for 30 seconds + blow dry with nitrogen
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AR-N 7520.17 contrast curve. |