Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/AR-N 7520 New: Difference between revisions

From LabAdviser
← Older editNewer edit →
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
No edit summary
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
(No difference)

Revision as of 09:47, 20 January 2025

AR-N 7520 New is a resist provided by Allresist. The "New" is important, "AR-N 7520" and "AR-N 7520 New" are not the same resists.

Contrast curve

  • Coater: LabSpin 2
  • Substrate: 2" Si
  • Acceleration: 1000 RPM/s
  • Speed: 4000 RPM
  • Time: 60 s
  • Baking temperature: 85C
  • Baking time: 90 s
  • Exposure: 100 kV (JEOL 9500)
  • Development: AR 300-46 for 90 seconds
  • Stopper: IPA for 30 seconds + blow dry with nitrogen
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/AR-N_7520_New&oldid=50541"