Specific Process Knowledge/Lithography/Strip: Difference between revisions
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==Process chamber pressure for plasma asher 4 & 5== | ==Process chamber pressure for plasma asher 4 & 5== | ||
[[File: | [[File:PA_chamber_pressure_v2.png|320px|thumb|Ashing rate as function of chamber pressure.|right]] | ||
The ashing rate is related to the chamber pressure during processing. | The ashing rate is related to the chamber pressure during processing. | ||