Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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===Aligner: MA6 - 2=== | ===Aligner: MA6-2=== | ||
The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | The Aligner: MA6-2 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | ||