Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
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=== | ===Aligner: MA6 - 1=== | ||
The | The Aligner: MA6 - 1 has an i-line notch filter installed. This results in an exposure light peak around 365 nm with a FWHM of 7 nm. | ||
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For smaller angle (~5°), develop 30 seconds instead | For smaller angle (~5°), develop 30 seconds instead | ||
|} | |} | ||
===Aligner: MA6 - 2=== | ===Aligner: MA6 - 2=== | ||