Specific Process Knowledge/Lithography/UVLithography: Difference between revisions
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'''Pre-cleanroom work:''' | '''Pre-cleanroom work:''' | ||
#'''Complete the | #'''Complete the [https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography#Lithography_Tool_Package_Training Lithography TPT]. | ||
#'''Prepare a process flow:''' The process flow describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/Resist/UVresist#UV_resist_comparison_table|in this table]]</u>. | #'''Prepare a process flow:''' The process flow describes all steps in your UV lithography process. You can find docx-templates <u>[[Specific_Process_Knowledge/Lithography/Resist/UVresist#UV_resist_comparison_table|in this table]]</u>. | ||
#'''Design device''': Design your device and layout. A detailed instruction on how to design a layout (or mask) can be found <u>[[Specific_Process_Knowledge/Pattern_Design|here]]</u>. | #'''Design device''': Design your device and layout. A detailed instruction on how to design a layout (or mask) can be found <u>[[Specific_Process_Knowledge/Pattern_Design|here]]</u>. | ||