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Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch: Difference between revisions

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Line 5: Line 5:
!nano1.2
!nano1.2
!nano1.3
!nano1.3
|-
!nano1.21
!Tool
|Pegasus
|Pegasus
|Pegasus
|Pegasus
|-
|-
!C<sub>4</sub>F<sub>8</sub> (sccm)
!C<sub>4</sub>F<sub>8</sub> (sccm)
Line 17: Line 12:
|52
|52
|52
|52
|75
|-
|-
!SF<sub>6</sub> (sccm)
!SF<sub>6</sub> (sccm)
|38
|38
|38
|38
|38
Line 25: Line 22:
|-
|-
!O<sub>2</sub> (sccm)
!O<sub>2</sub> (sccm)
|0
|0
|0
|0
|0
Line 35: Line 33:
|800 (forward)
|800 (forward)
|600 (forward)
|600 (forward)
|800 (forward)
|-
|-
!Platen power (W)
!Platen power (W)
Line 41: Line 40:
|50
|50
|40
|40
|50
|-
|-
! Pressure (mtorr)
! Pressure (mtorr)
|4
|4
|4
|4
|4
Line 51: Line 52:
| 10
| 10
| 10  
| 10  
| -10
| -10
| -10
| -10
| -10
|-
|-
! Process time (s)
! Process time (s)
|120
|120
|120
|120
|120
Line 61: Line 64:
|-
|-
! Nominal line width
! Nominal line width
! colspan="4" align="center"| Etched depths (nm)
! colspan="5" align="center"| Etched depths (nm)
|-
|-
! 30 nm
! 30 nm
|
|
|
|
|
Line 70: Line 74:
|-
|-
!60 nm
!60 nm
|
|
|
|
|
Line 76: Line 81:
|-
|-
!90 nm
!90 nm
|
|
|
|
|
Line 82: Line 88:
|-
|-
!120 nm
!120 nm
|
|
|
|
|
Line 88: Line 95:
|-
|-
!150 nm
!150 nm
|
|
|
|
|
Line 94: Line 102:
|-
|-
! Nominal line width
! Nominal line width
! colspan="4" align="center"| Etch rates in trenches (nm/min)
! colspan="5" align="center"| Etch rates in trenches (nm/min)
|-
|-
!30 nm
!30 nm
|
|
|
|
|
Line 103: Line 112:
|-
|-
!60 nm
!60 nm
|
|
|
|
|
Line 109: Line 119:
|-
|-
!90 nm
!90 nm
|
|
|
|
|
Line 115: Line 126:
|-
|-
!120 nm
!120 nm
|
|
|
|
|
Line 121: Line 133:
|-
|-
!150 nm
!150 nm
|
|
|
|
|
Line 127: Line 140:
|-
|-
|
|
! colspan="4" align="center"| Etch rates in zep resist (nm/min)
! colspan="5" align="center"| Etch rates in zep resist (nm/min)
|-
|-
! One point on wafer
! One point on wafer
|
|
|
|
|
Line 140: Line 154:
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano12|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano13|Images]]
|[[Specific Process Knowledge/Etch/DRIE-Pegasus/nanoetch/nano121|Images]]
|-
|-
|}
|}