Specific Process Knowledge/Lithography/EBeamLithography/Cassettes: Difference between revisions
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! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm] !! PA to stage shift [µm] | ! Substrate size !! ID !! Slot ID !! Material !! Image !! Position indication !! Approximate offset [µm] !! PA to stage shift [µm] | ||
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| Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || [[image:BM4P-509 small.png|300px]] | | Chips || BM4P-509 || 3A, 3B, 3C, 3D || Ti || [[image:BM4P-509_cas.png|800px]] || [[image:BM4P-509 small.png|300px]] | ||
|| Measured 2024-01-05 | || Measured 2024-01-05 | ||
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3C: -840 µm | 3C: -840 µm | ||
3D: -975 µm | 3D: -975 µm || | ||
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