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Specific Process Knowledge/Etch/Wet Silicon Oxide Etch (BHF): Difference between revisions

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<gallery caption="Different places to do wet silicon oxide etch" widths="220px" heights="225px" perrow="5"> image:BHF clean.JPG|BHF clean wetbench 04 in D-3. Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
<gallery caption="Different places to do wet silicon oxide etch" widths="420px" heights="425px" perrow="5"> image:BHF clean.JPG|BHF in wetbench 04 in D-3 (Oxide etch 2: BHF (clean)). Wet silicon oxide etch bath positioned to the right in the wetbench. This bath can also be used for BHF with wetting agent.  
image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF.) The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch.
image:KOH_BHF.JPG|BHF in wetbench 01 Si etch in D-3 (Oxide etch 1: BHF). The BHF bath is positioned in the middle of the bench. This is primarily used to remove oxide before and after a Si etch.
image:RCA-HF.jpg|HF baths in RCA bench in B-1.  
image:RCA-HF.jpg|HF baths in RCA bench in B-1. These may only be used together with RCA cleaning and furnace processes.
image:Stinkskab RR2.jpg|The HF bath in 'Fume hood(RCA)' in cleanroom B-1 is only for use during special RCA cleaning processes inside the fume hood. </gallery>
</gallery>




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