Specific Process Knowledge/Thermal Process/Oxidation/Wet oxidation C1 furnace: Difference between revisions
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The Anneal Oxide furnace (C1) is the used for annealing, | The Anneal Oxide furnace (C1) is the used for annealing, and for dry and wet oxidation of 4" and 6" wafers. | ||
Water vapour for wet oxidation is generated by use of a steamer ([[media:RASIRC_Steam_generator.pdf|RASIRC Steam Generator ]] ) | Water vapour for wet oxidation is generated by use of a steamer, which gives a very good oxide quality and uniformity. | ||
A new steamer has been installed in August 2024. The new steamer is from Bronkhorst and similar to the one on the E1. The old steamer was from Rasirc. | |||
<!-- ([[media:RASIRC_Steam_generator.pdf|RASIRC Steam Generator ]] )--> | |||
==Calculation for wet oxidation== | ==Calculation for wet oxidation== | ||
<b><span style="color:Red">The information is this section is not up-to-date, because it is based on oxidation results obtained with the old Rasirc steamer. This steamer has been replaced with a Bronkhorst steamer in August 2024, and this has slightly affected the oxidation rate for wet oxide.</span></b> | |||
The following links give an approximate oxide time/thickness based on prediction equations from the following experiments: | The following links give an approximate oxide time/thickness based on prediction equations from the following experiments: | ||
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==Test of the wet oxidation by steamer== | ==Test of the wet oxidation by steamer== | ||
<b><span style="color:Red">The information is this section is not up-to-date, because it is based on oxidation results obtained with the old Rasirc steamer. This steamer has been replaced with a Bronkhorst steamer in August 2024, and this has slightly affected the oxidation rate for wet oxide.</span></b> | |||
''by Patama Pholprasit @nanolab in October 2014'' | ''by Patama Pholprasit @nanolab in October 2014'' | ||
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