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Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,530 edits
Line 598: Line 598:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!rowspan="2"| AZ 5214E
!rowspan="2"| AZ 5214E
|rowspan="2"| 2023-08-18<br>jehem
|rowspan="2"| 2024-08-16<br>taran
|rowspan="2"| 1.5 µm
|rowspan="2"| 1.5 µm
|rowspan="2"| 375
|rowspan="2"| 375
| Optical
| Optical
|rowspan="2"| Quality
|rowspan="2"| Quality
|rowspan="2"| 105 mJ/cm<sup>2</sup>
|rowspan="2"| 95 mJ/cm<sup>2</sup>
| 0
| 2
|rowspan="2"| 1.25 µm
|rowspan="2"| 1.5 µm
|rowspan="2"| Dev: SP60s
|rowspan="2"| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
| Pneumatic
| Pneumatic
| 3
| -2
|-
|-


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