Specific Process Knowledge/Characterization/XRD/XRD SmartLab/Instrumental broading in T2T: Difference between revisions
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This page describes the values of instrumental broadening in θ/2θ measurements and can be used as a | This page describes the values of instrumental broadening in θ/2θ measurements and can be used as a reference for peak broadening in grain size calculation. The most common slit configuration cases are chosen, both with and without the Ge220 monochromator. | ||
Latest revision as of 13:36, 12 August 2024
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This page is written by Evgeniy Shkondin @DTU Nanolab if nothing else is stated.
All images and photos on this page belongs to DTU Nanolab.
The fabrication and characterization described below were conducted in 2024 by Evgeniy Shkondin, DTU Nanolab.
This page describes the values of instrumental broadening in θ/2θ measurements and can be used as a reference for peak broadening in grain size calculation. The most common slit configuration cases are chosen, both with and without the Ge220 monochromator.
The instrumental broadening has been measured by using standard Si and LaB6 powder.
Scherrer formula:
where:
K is Scherrer constant (typically close to unity K=0.9-1)
λ is a wavelength of X-ray radiation (λ Cu-Kα1 = 1.540562 Å, and in case both Cu-Kα1 and Cu-Kα2 are present λ Cu-Kα1,2 = 1.541871 Å)
θ is Bragg angle
βsample is a peak broadening. The technical point should be noted that intergal breadth and/or FWHM have to be inserted in radians.
in the case where the peaks obey Lorentzian (or Cauchy) distribution profile.
in the case of Gaussian distribution profile.
Experimental results implied that crystallite size causes Cauchy-type broadening, while strain broadening is associated with a Gaussian profile. Real measurements contain contributions from both Lorentzian (Cauchy) and Gaussian distributions.
Both LaB6 and Si powder provided the best fit with a Gaussian function. Therefore, all the results below are presented using a Gaussian fit.
It also seems necessary to use a high-quality single crystal to include both Lorentzian and Gaussian contributions and fit with a Pseudo-Voight approach.
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LaB6 and Si powders mounted on a Silicon-(100) wafer chip using double sticky Kapton tape.
Full scans
Here the full scans of LaB6 and Si powder are presented. Each sample was measured with and without the Ge220 monochromator on the incident side, with the Incident Slit (IS) set to either 0.5 mm or 1 mm. On the receiving side, RS1 = 0.5 mm and RS2 = 0.525 mm were used for IS = 0.5 mm, and RS1 = 1 mm and RS2 = 1.125 mm were used for IS = 1 mm. The step width was 0.01° and the speed was 2°/min for all scans. A Soller slit of 5° was selected as the Receiving Parallel Slit (RPS) for all scans. In the case of the IPS adapter, the Soller slit of 5° was used.
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Measured LaB6 powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured LaB6 powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured LaB6 powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured LaB6 powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured Si powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured Si powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured Si powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Measured Si powder reference sample in a range of 20-120° of 2θ. Area marked as gray contains a main 004 Si peak from a silicon chip which is a holder for powder sample.
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Calculated FWHM as a function of 2θ.
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Calculated Integral breadth as a function of 2θ.
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Gaussian fitted FWHM of measured LaB6 and Si powder reference samples using Ge220 monochromator with IS = 0.5 mm.
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Gaussian fitted FWHM of measured LaB6 and Si powder reference samples using Ge220 monochromator with IS = 1.0 mm.
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Gaussian fitted FWHM of measured LaB6 and Si powder reference samples using IPS adaptor with IS = 0.5 mm.
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Gaussian fitted FWHM of measured LaB6 and Si powder reference samples using IPS adaptor with IS = 1.0 mm.
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Gaussian fitted Integral breadth of measured LaB6 and Si powder reference samples using Ge220 monochromator with IS = 0.5 mm.
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Gaussian fitted Integral breadth of measured LaB6 and Si powder reference samples using Ge220 monochromator with IS = 1.0 mm.
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Gaussian fitted Integral breadth of measured LaB6 and Si powder reference samples using IPS adaptor with IS = 0.5 mm.
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Gaussian fitted Integral breadth of measured LaB6 and Si powder reference samples using IPS adaptor with IS = 1.0 mm.
case1 - LaB6 with Ge220 monochromator
LaB6 Ge220 monochromator on incident side | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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case2 - LaB6 with IPS adaptor
LaB6 IPS on incident side | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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case3 - Si powder with Ge220 monochromator
Si powder Ge220 monochromator on incident side | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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case4 - Si powder with IPS adaptor
Si powder IPS on incident side | ||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||||
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