Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
| Line 3: | Line 3: | ||
=SiO2 trench etching with Cr mask= | =SiO2 trench etching with Cr mask= | ||
[[test12]] | |||
{| border="2" cellspacing="2" cellpadding="3" | {| border="2" cellspacing="2" cellpadding="3" | ||
!Start parameters, variations noted in the gallery headline | !Start parameters, variations noted in the gallery headline | ||