Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
| Line 49: | Line 49: | ||
|} | |} | ||
== | ==Array of small boxes approach== | ||
In this approach the pattern is an array of 2x2 nm boxes, each box will be filled with a single beam shot and hence the beam placement is determined by the boxes in the array. Thus, this is a more versatile approach as it allows the user to easily vary distance between shots and create hexagonal arrays or similar. The exposure is however somewhat slower since each shape adds a few ns of beam settling time. The beam pitch as setup in the SHOT S command should be large enough that a single beam shot is placed in each 2x2 nm box, i.e. it should just be larger than 2 nm. | |||
==Results== | ==Results== | ||