Specific Process Knowledge/Lithography/EBeamLithography/EBLProcessExamples: Difference between revisions
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==Results== | ==Results== | ||
[[ | {| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;" | ||
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| [[Image:SingleShotChart.png|400px]] | |||
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Circle size as a function of pitch and dwell time for exposure at 29 nA. | |||
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''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931714000987 Single-spot e-beam lithography for defining large arrays of nano-holes]''' | ||
=Article on quality control on the JEOL 9500 system= | =Article on quality control on the JEOL 9500 system= | ||
''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ''' [http://www.sciencedirect.com/science/article/pii/S0167931716300466 Quality control of JEOL JBX-9500FSZ lithography system in a multi-user laboratory]''' | ||