Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 406: Line 406:
|+  Condition files and beam current
|+  Condition files and beam current
|-
|-
! Typical beam current [nA] !! Aperture !! Condition file
! Beam current [nA] !! Aperture !! Condition file
|-
|-
| 0.12 || 4 || 0.12na_ap4
| 0.12 || 4 || 0.12na_ap4
Line 412: Line 412:
| 0.16 || 4 || 0.16na_ap4
| 0.16 || 4 || 0.16na_ap4
|-
|-
| 0.227 || 4 || 0.22na_ap4
| 0.22 || 4 || 0.22na_ap4
|-
|-
| 0.4 || 4 || 0.4na_ap4
| 0.4 || 4 || 0.4na_ap4
Line 418: Line 418:
| 0.5 || 4 || 0.5na_ap4
| 0.5 || 4 || 0.5na_ap4
|-
|-
| 0.815 || 4 || 0.8na_ap4
| 0.8 || 4 || 0.8na_ap4
|-
|-
| 1.4 || 4 || 1.4na_ap4
| 1.4 || 4 || 1.4na_ap4
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/JEOLJobPreparation"