Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
Appearance
| Line 427: | Line 427: | ||
|- | |- | ||
| 2.7 || 4 || 2.7na_ap4 | | 2.7 || 4 || 2.7na_ap4 | ||
|- | |||
| 3.8 || 5 || 3.8na_ap5 | |||
|- | |- | ||
| 4 || 4 || 4na_ap4 | | 4 || 4 || 4na_ap4 | ||
|- | |- | ||
| 5 || 5 || 5na_ap5 | | 5 || 5 || 5na_ap5 | ||