Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
Appearance
| Line 402: | Line 402: | ||
=Available condition files= | =Available condition files= | ||
The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below. | The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below. | ||
{| class="wikitable" | {| class="wikitable" | ||
| Line 420: | Line 419: | ||
|- | |- | ||
| 0.815 || 4 || 0.8na_ap4 | | 0.815 || 4 || 0.8na_ap4 | ||
|- | |||
| 1.4 || 4 || 1.4na_ap4 | |||
|- | |||
| 1.6 || 4 || 1.6na_ap4 | |||
|- | |||
| 2 || 4 || 2na_ap4 | |||
|- | |||
| 2.7 || 4 || 2.7na_ap4 | |||
|- | |||
| 4 || 4 || 4na_ap4 | |||
|- | |||
| 3.8 || 5 || 3.8na_ap5 | |||
|- | |||
| 5 || 5 || 5na_ap5 | |||
|- | |||
| 6 || 5 || 6na_ap5 | |||
|} | |} | ||