Specific Process Knowledge/Lithography/EBeamLithography/JEOLJobPreparation: Difference between revisions
| Line 402: | Line 402: | ||
=Available condition files= | =Available condition files= | ||
The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below. | The beam current can in principle be changed in very fine steps, it however requires recalibration of the Dynamic Focus and Dynamic Stigmation table. Hence, only a limited number of beam currents are available. The available beam currents and condition file name are listed below. | ||
{| class="wikitable" | |||
|+ Condition files and beam current | |||
|- | |||
! Beam current !! Aperture !! Condition file | |||
|- | |||
| 0.22 || 4 || 0.22na_ap4 | |||
|} | |||