Specific Process Knowledge/Lithography/Resist/UVresist: Difference between revisions
Appearance
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|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
!Exposure tool | !Exposure tool | ||
|align="center" colspan=" | |align="center" colspan="6"|Mask aligner or Maskless aligner | ||
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*High aspect ratio | *High aspect ratio | ||
*Resist thickness 1 µm to several 100 µm | *Resist thickness 1 µm to several 100 µm | ||
*Available in cleanroom: 2005, 2035, and 2075 | |||
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Spray coater specific resist | Spray coater specific resist | ||