Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
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!Generel description | !Generel description | ||
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*Dry and wet oxidation | *Dry and wet oxidation | ||
*Boron pre-deposition and boron drive-in are also done in the furnace | *Boron pre-deposition and boron drive-in are also done in the furnace | ||
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*Dry and wet oxidation of 100 mm and 150 mm wafers | *Dry and wet oxidation of 100 mm and 150 mm wafers | ||
*Oxidation and annealing of wafers from the LPCVD furnaces and PECVD4 | *Oxidation and annealing of wafers from the LPCVD furnaces and PECVD4 | ||
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*Dry and wet oxidation and annealing of wafers from the wafer bonders and from PECVD4 and PECVD3 | *Dry and wet oxidation and annealing of wafers from the wafer bonders and from PECVD4 and PECVD3 | ||