Specific Process Knowledge/Thermal Process/Resist Pyrolysis furnace/Acceptance test: Difference between revisions
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''This page is written by DTU Nanolab internal'' | ''This page is written by DTU Nanolab internal'' | ||
==Multipurpose Anneal furnace acceptance test== | ==Resist Pyrolysis (former Multipurpose Anneal) furnace acceptance test== | ||
The acceptance for the Multipurpose Anneal furnace was performed in November 2014 by ATV Technologie and DTU Nanolab. | The acceptance for the Resist Pyrolysis (former Multipurpose Anneal) furnace was performed in November 2014 by ATV Technologie and DTU Nanolab. | ||
At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times | At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times |
Latest revision as of 13:50, 26 February 2024
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This page is written by DTU Nanolab internal
Resist Pyrolysis (former Multipurpose Anneal) furnace acceptance test
The acceptance for the Resist Pyrolysis (former Multipurpose Anneal) furnace was performed in November 2014 by ATV Technologie and DTU Nanolab.
At the acceptance test a dry oxide layer was grown on a boat of 150 mm wafers. The oxide growth was repeated three times
For each run the oxide thickness and refractive index were measured on three of the wafers, and the standard deviation and non-uniformity were calculated for each wafer, over the boat and from run to run.
Oxidation parameters
Recipe: "vr_dryOx_1000C_120min_150_5Wafer_D1_mit_Inliner_oPurgering.ATV"
Oxidation time: 80 min
Temperature: 1050 oC (all temperature zones)
O2 flow: 1 slm
The oxidation has been done with 150 mm wafers. The number of wafers in the boat was 30.
Wafer 4 (towards the door), wafer 16 and wafer 28 (towards the service area) were measured in 13 points using the M-2000V ellipsometer.
Results
Oxide thickness
Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | Average oxide thickness [nm] | St. deviation | Non-uniformity [%] | ||
Run 1 | 28-01-2015 | 109.7 | 1.0 | 1.7 | 107.7 | 0.9 | 1.1 | 106.5 | 0.8 | 1.2 | 107.0 | 2.1 | 1.9 |
Run 2 | 28-01-2015 | 107.3 | 1.7 | 2.4 | 105.0 | 1.4 | 1.7 | 107.3 | 0.7 | 0.9 | 105.7 | 1.0 | 0.9 |
Run 3 | 30-01-2015 | 103.6 | 0.8 | 1.1 | 102.6 | 0.6 | 1.2 | 102.2 | 0.6 | 1.1 | 102.9 | 1.0 | 1.0 |
Average | 106.9 | 1.2 | 1.7 | 105.1 | 1.0 | 1.3 | 105.3 | 0.7 | 1.1 | 105.2 | 1.4 | 1.3 |
Run-to-run | ||
---|---|---|
Average oxide thickness [nm] | St. deviation | Non-uniformity [%] |
105.2 | 2.1 | 2.0 |
Refractive index
Date | Wafer 4 | Wafer 16 | Wafer 28 | Center point only | |||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | Average refractive index | St. deviation | Non-uniformity [%] | ||
Run 1 | 28-01-2015 | 1.46 | 0.00 | 0.04 | 1.46 | 0.00 | 0.07 | 1.46 | 0.00 | 0.06 | 1.4609 | 0.0004 | 0.0230 |
Run 2 | 28-01-2015 | 1.46 | 0.00 | 0.09 | 1.46 | 0.00 | 0.17 | 1.44 | 0.01 | 0.69 | 1.4561 | 0.0094 | 05873 |
Run 3 | 30-01-2015 | 1.46 | 0.00 | 0.06 | 1.46 | 0.00 | 0.05 | 1.46 | 0.00 | 0.07 | 1.4602 | 0.0004 | 0.0291 |
Average | 1.46 | 0.00 | 0.06 | 1.46 | 0.00 | 0.10 | 1.46 | 0.00 | 0.27 | 1.46 | 0.00 | 0.21 |
Run-to-run | ||
---|---|---|
Average refractive index | St. deviation | Non-uniformity [%] |
1.4591 | 0.0026 | 0.1637 |