Specific Process Knowledge/Lithography/EBeamLithography/AR-P 617: Difference between revisions

@@ Line 75: / Line 75: @@
 The second development can be further extended to promote additional undercut.
+{| style="border: none; border-spacing: 0; margin: 1em auto; text-align: center;"
+|-
+| [[image:ARP617_240212_D1005.tif|800px]]
+|-
+| colspan="1" style="text-align: center;|
+AR-P 617.06 contrast curve from three different soft bake temperatures. Fitted lines are for determining contrast.
+|}