Specific Process Knowledge/Thin film deposition/Deposition of Alumina: Difference between revisions
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*[[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-System(Lesker)]] | *[[Specific Process Knowledge/Thin film deposition/Lesker|Sputter-System(Lesker)]] | ||
*[[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|Sputter-System Metal-Oxide(PC1)]] | *[[Specific_Process_Knowledge/Thin_film_deposition/Cluster-based_multi-chamber_high_vacuum_sputtering_deposition_system#Standard_recipe_performance|Sputter-System Metal-Oxide(PC1)]] | ||
*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition of Alumina/E-beam Evaporation of Al2O3 in Temescal-2|Evaporation of | *[[Specific_Process_Knowledge/Thin_film_deposition/Deposition of Alumina/E-beam Evaporation of Al2O3 in Temescal-2|Evaporation of Al<sub>2</sub>O<sub>3</sub> in E-Beam Evaporator (10-pockets)]] | ||
==Comparison of the methods for deposition of Alumium Oxide== | ==Comparison of the methods for deposition of Alumium Oxide== | ||