Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions

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 <gallery caption="SiO2 etch with Cr mask on wafer piece on Si carrier 14 min etch, EM:0/0" perrow="7" widths="200px" heights="150px">
-File:C10576_10.jpg
-File:C10576_08.jpg
-File:C10576_06.jpg
 File:C10576_02.jpg
+File:C10576_01.jpg
 File:C10576_04.jpg
-File:C10576_01.jpg
+File:C10576_06.jpg
+File:C10576_08.jpg
+File:C10576_10.jpg
+File:C10576_19.jpg
 File:C10576_22.jpg
-File:C10576_19.jpg
 File:C10576_17.jpg
 </gallery>