Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-4/SiO2 Etch/Cr mask: Difference between revisions
| Line 84: | Line 84: | ||
|} | |} | ||
===Profile SEM images=== | ===Profile SEM images=== | ||
{| border="2" cellspacing="2" cellpadding="3" | |||
!Recipe settings | |||
!SEM gallery | |||
|- | |||
|Text | |||
| | |||
<gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | <gallery caption="SiO2 etch with Cr mask on full wafer 6 min etch" perrow="6" widths="200px" heights="150px"> | ||
| Line 295: | Line 301: | ||
File:C10844_13.jpg | File:C10844_13.jpg | ||
</gallery> | </gallery> | ||
|} | |||
===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ===Profile, top view at tilted SEM images on 800 nm pitch and 50% duty cycle ( look at the Cr mask in top of the page=== | ||