Specific Process Knowledge/Lithography/EBeamLithography/EBLsubstratePrep: Difference between revisions
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|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P610_english_Allresist_product-information.pdf AR-P 617 info] | |[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P610_english_Allresist_product-information.pdf AR-P 617 info] | ||
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | |[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|Spin Coater: LabSpin 02/03]] | ||
|a = | |a = 65274, b = -0.748, c = 163.1? | ||
|PGMEA | |PGMEA | ||
|AR 600-50 | |AR 600-50 | ||